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Plasma Cleaning
Chemical cleaning of vacuum components and equipment is a cost-efficient method of cleaning after manufacturing. This process is used throughout the industry and is entirely sufficient for most applications in the vacuum field.
However, ever more applications in the high and ultra high vacuum arena as well as laser applications require an environment much cleaner than usually possible with standard chemical cleaning.
For these environments we have developed a Plasma Cleaning service which allows us to clean standard and custom components as well as small chambers.
This technology provides our customers a level of cleanliness in the process previously not achievable.

Cost
If you wish to have certain components cleaned through our cleaning services, please add 20% to the base cost of the component in question. Please contact us if you wish to process large quantities or entire chambers.

Process
  • A vacuum chamber is loaded with product and then sealed
  • It is then evacuated and the appropriate gas or gas mixture is added
  • The process gas is ignited and the surface contamination is vaporized
  • The process gas is constantly flushed out of the system with the process gas and replaced by new gas
  • The finished product is removed and sealed into a coated plastic bag to prevent recontamination

With surface temperatures in the 10,000°C area (18,000°F) the process eliminates all impurities usually found even on the most thoroughly cleaned surfaces.